SKU:55043968331

Cu Film on Ta/Silicon Wafer , Cu=100 nm Ta=20nm,,Si(100) B-doped ,10x5x0.525mm,R:1-20 ohm.cm, 1sp

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Regular price $34.44 USD
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Ships within 48 hours · Estimated delivery Jul 15 - Jul 20

Description

Cu Film on Ta/Silicon Wafer , Cu=100 nm Ta=20nm,,Si(100) B-doped ,10x5x0.525mm,R:1-20 ohm.cm, 1spSpecifications: Cu coated Si Wafer ( 10x5 mm size ) Thickness of highly oriented polycrystalline Cu <111> film: 100 nm Thickness of Ta diffusion barrier: 20 50 nm 10x5x 0. 5 mm thickness Si wafer (Prime Grade) P type, B doped, <100> orientation, SSP Resistivities: 1 20 ohm cm Surface Roughness: as grown , RA < 10 nm Package: One 1000 class clean room with 100 class plastic bag 10 pcs per package for minimum order

P = T x g x 10/ (

410 MPa (9 um)

20 containers per shipment ( please kindly don't ask to order less than 20 pcs

6mA-3000mA) by using a normal Ethernet cable connector via one computer

OVERALL TRAY SIZE Size       = 50

EQ-CR2016-Kapton are special CR-2016 coin cell cases with 10mm Kapton windows (5 set/pck)

Resistivity :                 0

Outlet connections are 1/4" NPT

8-Channel clips sets for coin cell

Temper: H19

TYPE:                                      NH20-200*100-28

MTI-HH-3450P

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